Rauschenberg Archives Research Residency
The Robert Rauschenberg Foundation (New York, NY)
The Robert Rauschenberg Foundation is pleased to announce an open call for applications to the fifth annual Archives Research Residency, a one- to three-week research intensive at the Rauschenberg Foundation Archives in New York City. The program provides support for accommodations and other expenses related to the visit.
The Rauschenberg Foundation Archives, consisting of Robert Rauschenberg’s personal papers and the records from his Florida and New York studios, is the most comprehensive body of information on the artist’s life and career. In addition, the archives holds unique materials on arts organizations, art movements, and collaborations in which Rauschenberg was involved.
Scholars, academics, artists, as well as non-traditional researchers are encouraged to apply. Applicants must:
- Demonstrate a compelling need to use the archival material onsite at the Foundation;
- Not have received a grant or other funding from the Foundation in the past 3 years; and
- Be at the graduate level and above.
All individuals eligible to travel in the United States are invited to apply. Priority will be given to independent researchers or those affiliated with institutions with limited resources. Present and former staff and consultants are ineligible. Ineligible individuals or those not selected are welcome to request research appointments independently.
The residency will take place during one of three sessions:
- Spring: April 21 – May 30, 2025
- Summer: July 14 – August 1, 2025
- Fall: September 9 – November 7, 2025
Typical residency hours are Monday – Friday from 10:30 – 5:00. We are closed Saturdays and Sundays. In July and August, we are closed on Fridays.
Please note, this residency does not include housing.
Applications are open until Friday, January 3, 2025, 11:59 PM EST. Download the Guidelines for information on eligible projects, selection criteria, stipend amounts, and how to apply. Learn more about the Archives Research Residency.